SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

摘要

PURPOSE: A substrate processing apparatus and a substrate processing method are provided to improve the reproducibility of a process by including a plurality of processing modules which perform different processes. CONSTITUTION: A base plate (112) is arranged in a chamber. A plurality of substrate supporting units supports each substrate. A plurality of processing modules (140a-140d) is arranged on a top plate of the chamber. An isolation gas splitter (132) forms a gas curtain. The processing modules include processing gas supply units to supply processing gases.