发明名称 Conductivity control of water content in solvent strip baths
摘要 A system and method for control of water content in a strip bath. The method to control water content in a solvent bath used for cleaning of semiconductor parts in the back end of semiconductor manufacturing requires addition of water to replace evaporated water. This is done by periodically adjusting a conductivity setpoint at least in part based on the elapsed chemical bathlife and at least in part based on the number of semiconductor parts that have been processed in the bath. The conductivity of the strip bath solution is then continuously measured (as by using an electrodeless conductivity probe). Water is added (as by a DI water injection system) into the bath solution whenever the solvent conductivity falls below the conductivity set point.
申请公布号 US8545636(B2) 申请公布日期 2013.10.01
申请号 US20070765922 申请日期 2007.06.20
申请人 MILLER GREG P.;JOHNSON MICHAEL R.;O'CONNOR JOHN J.;JOSEPH MARTIN;ATMEL CORPORATION 发明人 MILLER GREG P.;JOHNSON MICHAEL R.;O'CONNOR JOHN J.;JOSEPH MARTIN
分类号 B08B3/08;B08B7/04 主分类号 B08B3/08
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