SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing method and a substrate processing system which enable effective collection and reuse of an etching process liquid even if the concentration of substrate components becomes higher in the used etching process liquid.SOLUTION: A substrate processing method includes: a process liquid collection step where an etching process liquid used in an etching process of a substrate in a substrate processing mechanism is collected; a process liquid return step where the used and collected etching process liquid is returned to the substrate processing mechanism as a new etching process liquid; and a substrate component removal step where components of the substrate, which exist in the used etching process liquid, is removed before the used and collected etching process liquid is returned to the substrate processing mechanism.