发明名称 METHOD FOR MANUFACTURING GLASS SUBSTRATE, METHOD FOR MANUFACTURING MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, METHOD FOR MANUFACTURING SUBSTRATE WITH MULTILAYER REFLECTION FILM, METHOD FOR MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK
摘要 PROBLEM TO BE SOLVED: To provide a method for cleaning a glass substrate, which can reliably remove minute foreign substances existing on the surface of a glass substrate after having been mirror-polished, a method for manufacturing a mask blank, a method for manufacturing a transfer mask, a method for manufacturing a substrate with a multilayer reflection film, a method for manufacturing a reflective mask blank and a method for manufacturing a reflective mask.SOLUTION: The method for manufacturing a glass substrate the surface of which has been mirror-polished comprises the steps of: using a polishing liquid containing colloidal silica to subject the surface of the glass substrate to mirror polishing; holding the glass substrate having been mirror-polished on standby by immersing the glass substrate in a standby tank containing an aqueous solution; and subjecting the surface of the glass substrate having been taken out from the standby bath to two-fluid cleaning that sprays a cleaning liquid in which a liquid and gas are mixed, and cleans the surface. The aqueous solution in the standby bath has an oxidation reduction potential of 50 mV or less.
申请公布号 JP2013197478(A) 申请公布日期 2013.09.30
申请号 JP20120065457 申请日期 2012.03.22
申请人 HOYA CORP 发明人 HARADA KAZUAKI;YAMADA TAKAYUKI;UCHIDA NOBUE
分类号 H01L21/027;B08B3/02;C03C23/00;G03F1/22;G03F1/60;G03F1/82 主分类号 H01L21/027
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