发明名称 SUBSTRATE TRANSPORT METHOD AND SUBSTRATE TRANSPORT APPARATUS
摘要 OF THE DISCLOSUREA wafer is formed by molding two or more chips arranged planarly with a resin. The wafer is joined to a support plate via a double-faced adhesive tape having an adhesive layer on one side with a heating separation property, whereby a workpiece is formed. The workpiece is subjected to a given process, and then is heated on a first table for removing the support plate with a support-plate removing device. The wafer removed from the double-faced adhesive tape includes the resin in a softened state. The wafer is then transported while outer periphery on a surface of the wafer on a resin side is suction-held with a suction plate. During transporting the wafer, pressure within the suction head is adjusted in accordance with displacement in level of the wafer.Figure 18
申请公布号 SG193078(A1) 申请公布日期 2013.09.30
申请号 SG20130005970 申请日期 2013.01.24
申请人 NITTO DENKO CORPORATION 发明人 MASAYUKI YAMAMOTO;TAKUTO MURAYAMA
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