| 摘要 |
PROBLEM TO BE SOLVED: To allows forming of minute grooves, even when forming the many minute grooves on a substrate having a stepped structure, to equalize depths with each other in each of step parts and groove parts of the stepped structure.SOLUTION: In a method of manufacturing a master mold 10 and a surface processing method, on a substrate 1 having a stepped structure 2, a resist film 3 is formed so that thicknesses tand tof the resist film 3 in each of step parts 2a and groove parts 2b of the stepped structure 2 satisfy a predetermined requirement and a difference between them becomes small. A pattern corresponding to a rugged structure 12 to be formed is drawn on the resist firm 3 by use of an electron beam drawing device. After developing the drawn resist film 3, the substrate 1 is etched while using the resist firm 3 as a mask. |
