摘要 |
PROBLEM TO BE SOLVED: To solve such a problem that in a resist pattern obtained by using a resist composition containing conventionally known acid generator, line edge roughness (LER) is not always sufficiently satisfied.SOLUTION: A salt is expressed by formula (I). [In formula (I), Q, Q, Q, and Qeach independently express a fluorine atom or a perfluoroalkyl group having 1-6 carbons; Land Leach independently express a bivalent saturated hydrocarbon group having 1-17 carbons, and a methylene group composing the bivalent saturated hydrocarbon group may be substituted by an oxygen atom or a carbonyl group. Rexpresses a hydrogen atom or an alkyl group having 1-6 carbons; Rexpresses a hydroxy group or a hydroxyalkyl group having 1-6 carbons; and Zand Zare each independently express an organic counterion]. |