发明名称 SALT, RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST PATTERN
摘要 PROBLEM TO BE SOLVED: To solve such a problem that in a resist pattern obtained by using a resist composition containing conventionally known acid generator, line edge roughness (LER) is not always sufficiently satisfied.SOLUTION: A salt is expressed by formula (I). [In formula (I), Q, Q, Q, and Qeach independently express a fluorine atom or a perfluoroalkyl group having 1-6 carbons; Land Leach independently express a bivalent saturated hydrocarbon group having 1-17 carbons, and a methylene group composing the bivalent saturated hydrocarbon group may be substituted by an oxygen atom or a carbonyl group. Rexpresses a hydrogen atom or an alkyl group having 1-6 carbons; Rexpresses a hydroxy group or a hydroxyalkyl group having 1-6 carbons; and Zand Zare each independently express an organic counterion].
申请公布号 JP2013194014(A) 申请公布日期 2013.09.30
申请号 JP20120064927 申请日期 2012.03.22
申请人 SUMITOMO CHEMICAL CO LTD 发明人 SAKAMOTO HIROSHI;ICHIKAWA KOJI
分类号 C07C309/17;C07C381/12;C09K3/00;G03F7/004;G03F7/039 主分类号 C07C309/17
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