| 摘要 |
PROBLEM TO BE SOLVED: To provide a reflective mask with a light-shielding frame having high light shielding performance.SOLUTION: A reflective mask includes at least: a substrate; a multilayer reflection layer that is formed on a surface of the substrate and reflects EUV light; a protection layer of the multilayer reflection layer formed on the multilayer reflection layer; and an absorbing layer that is formed on the protection layer and absorbs the EUV light. At least in part of an outer peripheral part surrounding a circuit pattern region formed on the absorbing layer, a thin film for absorbing the EUV light is formed on a sidewall part of a groove formed by etching away the absorbing layer, the protection layer and the multilayer reflection layer by anisotropic dry etching. |
