发明名称 EXPOSURE DEVICE AND EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To make it possible to check, midway through conversion into DMD data, whether the conversion of a drawing pattern is done correctly.SOLUTION: Drawing data is modulated using a DMD, in which a plurality of mirrors are arranged in two directions, and the modulated drawing data is supplied to a light beam irradiation device. When doing so, parity graphics for checking whether the drawing data is drawn correctly is arranged outside a drawing area in advance. In a stage of generating the drawing data, it is sensed in real time whether the parity graphics is detected at a predetermined position to thereby make a discrimination between normal drawing and abnormal drawing.
申请公布号 JP2013197452(A) 申请公布日期 2013.09.30
申请号 JP20120065039 申请日期 2012.03.22
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 KITAMURA JUNICHI;MOCHIZUKI MASAAKI;MAEDA YASUYUKI
分类号 H01L21/027;H01L21/677 主分类号 H01L21/027
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