| 摘要 |
PURPOSE: An apparatus for thermally processing the surface of a substrate using a flash lamp is provided to improve the efficiency of a thermal process by preventing the substrate from being expanded or damaged due to heat. CONSTITUTION: A transfer unit (130) transfers a substrate (10) from an inlet to an outlet of a chamber (100). The transfer unit includes a plurality of transfer rollers (131). A flash lamp (310) thermally processes the surface of the substrate by irradiating a flash to the surface of the substrate. The flash lamp irradiates light of a wavelength of 400 to 500 nm to the surface of the substrate for 0.1 to 50 ms. A reflection plate (300) reflects the flash from the flash lamp to the substrate. |
