发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE LAMINATE, FLEXIBLE CIRCUIT BOARD, AND PERMANENT PATTERN FORMATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition suitable to form a cured film such as a solder resist while having excellent incombustibility, having satisfactory bending resistance and plating resistance (resistance to plating solutions) also.SOLUTION: The photosensitive resin composition contains (A) an acid-modified ethylenically unsaturated group-containing polyurethane resin, (B) a radical polymerizable compound, and (C) a photoinitiator. The (B) radical polymerizable compound contains (B-1) a phosphorus-containing compound having an ethylenically unsaturated group in a molecule, and (B-2) a compound having an urethane structure and a (meta)acryloyl group in a molecule.
申请公布号 JP2013195665(A) 申请公布日期 2013.09.30
申请号 JP20120062063 申请日期 2012.03.19
申请人 FUJIFILM CORP 发明人 ISOBE HIDEMI
分类号 G03F7/027;G03F7/004;G03F7/09 主分类号 G03F7/027
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