| 摘要 |
PROBLEM TO BE SOLVED: To enhance the quality of plasma processing for a workpiece while maintaining the speed of plasma processing, by reducing the self-bias voltage thereby not scraping a dielectric window 4.SOLUTION: In the plasma processing method for plasma processing a workpiece placed in a vacuum vessel by introducing a plasma generation gas into the vacuum vessel, and making the gas plasma by making a high frequency alternating magnetic field act in the vacuum vessel, the height position of the central part of an antenna generating an alternating magnetic field when supplied with a high frequency power can be adjusted higher than the height position of the outer peripheral part of the antenna. |
