发明名称 POLYLACTIC ACID MOLDING WITH VAPOR DEPOSITION FILM AND ITS PRODUCTION PROCESS
摘要 PROBLEM TO BE SOLVED: To provide a polylactic acid molding capable of fully exerting characteristics of a hydrocarbon based vapor deposition film, by forming the hydrocarbon based vapor deposition film with a series of consecutive plasma CVD (chemical vapor deposition) process without switch-over of reaction gasses, causing no thermal deformation or thermal deterioration of the polylactic acid substrate, and allowing a high adhesion to the polylactic acid substrate.SOLUTION: A polylactic acid molding consists of a polylactic acid substrate 1, and a hydrocarbon based vapor deposition film 3 formed on the substrate surface by the plasma CVD process. The polylactic acid substrate 1 exhibits a sharp X-ray diffraction peak of 1.22° or lower in the peak half value width that appears in a wide angle X-ray measurement of 10°-25°. The hydrocarbon based vapor deposition film 3 is formed on the surface of polylactic acid substrate 1 and has two layers of a high CHlayer 3a which is 40% or higher in CHratio per sum total of CH, CHand CH, and a low CHlayer 3b which is formed on the high CHlayer 3a and is 35% or lower in CHratio per sum total of CH, CHand CH.
申请公布号 JP2013193336(A) 申请公布日期 2013.09.30
申请号 JP20120063241 申请日期 2012.03.21
申请人 TOYO SEIKAN CO LTD 发明人 ITO TAKURO;OZAWA SATOMI;KITO SATOSHI;YAMAZAKI KAZUHIKO
分类号 B32B27/36;B65D23/08;B65D65/46;C23C16/27 主分类号 B32B27/36
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