DEPOSITION APPARATUS AND DEPOSITION METHOD FOR FUNCTIONAL THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a deposition apparatus and a deposition method for a functional thin film capable of forming the functional thin film on both sides of a substrate and allowing the functional thin film to exhibit its characteristics according to its film thickness.SOLUTION: A deposition apparatus for a functional thin film for forming the functional thin film by vapor-depositing a functional material on a substrate includes: a substrate holding means of holding the substrate W in a vertical direction; a heating means 11 arranged to face both sides of the substrate and heating the substrate to a predetermined temperature; and a functional material supply means evaporating the functional material from a target T and supplying the functional material to both sides of the substrate. A deposition method for the functional thin film using the deposition apparatus for the functional thin film is also provided.