| 摘要 |
PROBLEM TO BE SOLVED: To provide an application apparatus capable of preventing an application liquid from wrapping around to a back surface of a substrate even when the application liquid is applied even to an area close to an end edge of the substrate.SOLUTION: A gas jetting part 51 is disposed at an outer peripheral part of a support part 19 supporting a back surface of a substrate 100, and a liquid receiving part 53 is disposed at the further outer peripheral part of the gas jetting part 51. The gas jetting part 51 and the liquid receiving part 53 are disposed inside a recess formed on a stage. The gas jetting part 51 has on its upper surface, many gas jetting ports turning to the substrate 100 supported by the support part 19. The gas jetting ports are connected with a supply source of a gas, and jet the gas to the vicinity of the end edge of the substrate 100 projected from the support part 19. |
