| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of determining an electron beam irradiation amount that can achieve convergence by proximity correction and increase process tolerance.SOLUTION: A method of determining an electron beam irradiation amount includes a process S1 of setting a first evaluation point Pon for evaluating cumulative energy of an electron beam irradiating the contour of a design pattern; a process S2 of providing an exposure amount "0" inside along a contour of the design pattern; a process of setting a second evaluation point Pse for evaluating cumulative energy of an electron beam irradiating a pair of contours of the exposure amount "0" which defines the exposure amount "0" pattern respectively; a process S4 of evaluating cumulative energy of an electron beam irradiating a bisector bisecting the interval between the pair of contours of the exposure "0" pattern; and an irradiation amount correction process S9 of finding cumulative energies at the first evaluation point Pon, second evaluation point Pse, and third evaluation point Ps respectively, evaluating the cumulative energies, and correcting the irradiation amount of the electron beam based upon evaluation results. |
