| 摘要 |
FIELD: metallurgy.SUBSTANCE: ion cleaning with heating and thermomechanical activation of substrate is performed with the help of electric arc evaporator in atmosphere of nitrogen by ion bombardment at 0.8-1.0 keV before deposition. Substrate surface cleaning is carried out in glow discharge at contactless heating by resistive heater to 400-430 K for 30 minutes. Then, substrate surface is thermo mechanically activated and heated by titanium ions to 665-695 K. Then, vacuum-plasma deposition of sandwiched coating is performed in atmosphere of nitrogen. Bottom layer of titanium nitride TIN with polycrystalline structure is applied for 3 minutes with final temperature of coating after deposition making 670-700 K. Then, alternating layers of two-component titanium nitride with nanocrystalline structure, three-component titanium and aluminium nitride Ti-Al-N with nanocrystalline structure are applied. Ti-N layer with nanocrystalline structure is deposited by evaporation of two titanium cathodes to 680-710 K for 3 minutes while Ti-Al-N layer of the same structure is applied by simultaneous evaporation of two titanium and one aluminium cathodes at heating the coating to 690-720 K for the same period. Deposition of alternating layers is carried out to top layer temperature of 730-760 K. Note here that Ti-Al-N layer is applied the last. Deposition of alternating layers is repeated at least three times.EFFECT: higher resistance to abrasive, high contact and thermal loads, and aggressive media.2 dwg |
