| 摘要 |
The present invention relates to a method of forming an upper electrode of a nanowire array and a nanowire array with the upper electrode formed. More particularly, the method according to the present invention includes the steps of: placing a polymer thin film; pressing; treating with a mixed solution; etching; and depositing an electrode material, thus making it possible to reliably form the upper electrode in a state where the polymer thin film is formed on a portion of the nanowires. Thus, various nano-devices may be implemented on the basis of the nanowire arrays that are aligned on a large-size silicon substrate. |
