| 发明名称 |
Polymer Compound, And Resist-Protecting Film Composition Including Same For A Liquid Immersion Exposure Process |
| 摘要 |
A polymer compound and a resist protective film composition for an immersion lithography process including the same. |
| 申请公布号 |
US2013252170(A1) |
申请公布日期 |
2013.09.26 |
| 申请号 |
US201313897014 |
申请日期 |
2013.05.17 |
| 申请人 |
HAN MAN HO;PARK JONG KYOUNG;KIM HYUN JIN;KIM JAE HYUN |
发明人 |
HAN MAN HO;PARK JONG KYOUNG;KIM HYUN JIN;KIM JAE HYUN |
| 分类号 |
G03F7/11 |
主分类号 |
G03F7/11 |
| 代理机构 |
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代理人 |
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| 主权项 |
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