| 发明名称 |
MIRROR, OPTICAL SYSTEM FOR EUV PROJECTION EXPOSURE SYSTEM AND METHOD OF PRODUCING A COMPONENT |
| 摘要 |
<p>A mirror for EUV radiation includes a mirror body, which has at least one EUV radiation-reflecting region and at least two EUV radiation-permeable regions. A spatial separation of the illumination and imaging beam paths is possible with small angles of incidence and a large object-side numerical aperture.</p> |
| 申请公布号 |
KR20130105858(A) |
申请公布日期 |
2013.09.26 |
| 申请号 |
KR20137010525 |
申请日期 |
2011.09.26 |
| 申请人 |
CARL ZEISS SMT GMBH |
发明人 |
RUOFF JOHANNES;FELDMANN HEIKO |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
| 代理机构 |
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| 主权项 |
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