| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition apparatus, and a film deposition method capable of suppressing arc generation.SOLUTION: In a film deposition apparatus 1, an AC power source 6 maintains the potential difference between a pair of targets 3, 4 at the potential difference (0V) of the absolute value smaller than that of the discharge voltage V1, -V1 during the predetermined periods B2, B4. By providing the periods B2, B4 in which the potential difference of the absolute value smaller than the absolute value of the discharge voltage V1, -V1 is maintained, a period in which any plasma is generated is formed. Thus, any abnormal discharge is prevented, and as a result, generation of any arc is prevented. |
