发明名称 Memory Cells
摘要 Some embodiments include methods of forming memory cells. An opening is formed over a first conductive structure to expose an upper surface of the first conductive structure. The opening has a bottom level with a bottom width. The opening has a second level over the bottom level, with the second level having a second width which is greater than the bottom width. The bottom level of the opening is filled with a first portion of a multi-portion programmable material, and the second level is lined with the first portion. The lined second level is filled with a second portion of the multi-portion programmable material. A second conductive structure is formed over the second portion. Some embodiments include memory cells.
申请公布号 US2013248797(A1) 申请公布日期 2013.09.26
申请号 US201213427529 申请日期 2012.03.22
申请人 SANDHU GURTEJ S.;SILLS SCOTT E.;MICRON TECHNOLOGY, INC. 发明人 SANDHU GURTEJ S.;SILLS SCOTT E.
分类号 H01L45/00;H01L21/8239 主分类号 H01L45/00
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