发明名称 |
LIQUID DEPOSITION PHOTOLITHOGRAPHY |
摘要 |
Systems and methods for liquid deposition photolithography are described. In particular, some embodiments relate to systems and methods for using photolithography to control the 2D structure of a thin layer of material (e.g., photopolymer) using various masks, projection optics and materials. In one or more embodiments, this thin layer can be manipulated by micro-fluidic techniques such that it can be formed, patterned and post-processed in a liquid environment, vastly simplifying the creation of multi-layer structures. Multiple layers are rapidly built up to create thick structures of possibly multiple materials that are currently challenging to fabricate by existing methods. |
申请公布号 |
CA2867861(A1) |
申请公布日期 |
2013.09.26 |
申请号 |
CA20132867861 |
申请日期 |
2013.03.22 |
申请人 |
THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODYCORPORATE |
发明人 |
MCLEOD, ROBERT R.;URNESS, ADAM;COLE, MICHAEL;MOORE, ERIC |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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地址 |
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