发明名称 METHOD FOR PLATING ON ELECTRODE LAYER
摘要 PROBLEM TO BE SOLVED: To provide a method for plating on an electrode layer, whereby highly uniform film thickness and high denseness can be achieved and production cost can be reduced.SOLUTION: A method for plating on an electrode layer is intended for performing plating on a surface of the electrode layer 5 essentially comprising Al formed on a substrate 1. The method comprises: using a solution containing an amphiphilic agent and Zn ions, depositing the Zn ions in the solution onto the surface of the electrode layer 5 by the Langmuir-Blodgett method and replacing Al components in the electrode layer 5 by the Zn ions, thereby forming Zn nuclei on the surface of the electrode layer 5; and subsequently performing an electroless plating treatment.
申请公布号 JP2013189679(A) 申请公布日期 2013.09.26
申请号 JP20120056575 申请日期 2012.03.14
申请人 FUJI ELECTRIC CO LTD 发明人 OGURA KEISUKE
分类号 C23C18/18;C23C18/34;H01L21/288;H01L21/60 主分类号 C23C18/18
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