| 摘要 |
PROBLEM TO BE SOLVED: To provide a technique capable of drawing a next pattern by overlapping it on a base pattern with high accuracy while suppressing decrease in throughput.SOLUTION: A drawing device 1 includes: an optical unit 40 which relatively moves along a main scanning axis with respect to a stage 10, emits drawing light to a substrate held on the stage 10 and draws a pattern on a substrate W; a preceding imaging part 50 which alternatively images any one of a pair of regions holding an irradiation position of the drawing light therebetween along the main scanning axis in a plane of the substrate W; an objective lens 450 which forms an image of the drawing light on the surface of the substrate W and condenses light for imaging on the surface of the substrate W; and a control part 90 which detects a formation position of the base pattern formed precedingly on the substrate W on the basis of the imaging data acquired by the preceding imaging part 50 and makes an optical path correction part 46 correct the irradiation position of the drawing light on the basis of the detected position. |
