| 摘要 |
PROBLEM TO BE SOLVED: To provide a curable composition for optical imprint, the curable composition exhibiting a high filling ratio into molds and low release defect density and ensuring high dry etching resistance.SOLUTION: A curable composition for optical imprint includes a monofunctional monomer, a polyfunctional monomer and a photopolymerization initiator, and has viscosity of 15 mPa s or less at 25°C, an Ohnishi parameter of 3.0 or less, and the crosslink density of 0.6 mmol/cmor more as calculated by formula (1): crosslink density=[&Sgr;(the content (mass ratio) of the polyfunctional monomer×the number of functional groups of the polyfunctional monomer/the molecular weight of the polyfunctional monomer)]/specific gravity. |
