发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device and a semiconductor manufacturing apparatus, capable of peeling a pasted protection tape, without contacting a rear surface of a wafer.SOLUTION: A method for manufacturing a semiconductor device includes a first step of placing a semiconductor substrate to which a protection tape is pasted through a support substrate, with the protection tape looking downward, on a stage where a peeling tape whose adhesive surface is looking upward is placed; a second step of depressurizing the semiconductor substrate under a condition in which it is placed on the adhesive surface of the peeling tape with the protection tape looking downward, so that the peeling tape is pasted to the protection tape; a third step of pulling the peeling tape toward the lower side of the stage under a condition in which the peeling tape is pasted to the protection tape, so that the protection tape is peeled; and a fourth step of supporting a surface of the support substrate which is exposed from the protection tape by pulling.
申请公布号 JP2013191745(A) 申请公布日期 2013.09.26
申请号 JP20120057279 申请日期 2012.03.14
申请人 TOSHIBA CORP 发明人 YAMASHITA DAISUKE
分类号 H01L21/683;H01L21/304 主分类号 H01L21/683
代理机构 代理人
主权项
地址