| 摘要 |
PROBLEM TO BE SOLVED: To improve soaking properties of vapor deposition material gas between each components of a film forming apparatus.SOLUTION: A film forming apparatus 1000 includes: a material container 1100 in which a vapor deposition material is accommodated; a transport pipe 1200 for transporting gas that includes a vapor of the vapor deposition material evaporated in the material container 1100; and a vapor deposition head 1300 for jetting the gas that has been transported through the transport pipe 1200 and includes the vapor of the vapor deposition material. The film forming apparatus 1000 also includes a heater heating the material container 1100, the transport pipe 1200, and the vapor deposition head 1300. In addition, the material container 1100, the transport pipe 1200, the vapor deposition head 1300 and the heater are accommodated in a vacuum container 1400. |
