METHOD FOR PRODUCING POLYMER COMPOUND, POLYMER COMPOUND, RESIST COMPOSITION, AND RESIST PATTERN FORMATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a polymer compound useful as a base material component of a resist composition, a polymer compound obtained by the production method, a resist composition containing the polymer compound, and a resist pattern formation method using the resist composition.SOLUTION: A method for producing a polymer compound at least includes polymerizing a monomer having a group to decompose by exposure and generate an acid, in an organic solvent containing an alcohol having a cyclic ether skeleton whose cyclic portion has 2 to 6 carbon atoms. A polymer compound is produced by the production method of the polymer compound. A resist composition contains the polymer compound. A resist pattern formation method includes a step of forming a resist film using the resist composition, a step of exposing the resist film, and a step of developing the resist film to form a resist pattern.