| 摘要 |
<p>The present invention relates to an extreme ultraviolet (EUV) light generating device for stabilization and improving energy efficiency through laser beam correction. The EUV plasma generation device according to the present invention includes: a laser source which outputs a laser beam; a correction part correcting a wave front of the laser beam which is output from the laser source; a tunable laser mirror (TLM) once again reflecting the reflected laser beam of which the wave front is corrected in the correction part; a focusing mirror (FM) focusing the laser beam reflected by the TLM; a gas cell which receives the focused laser beam from the FM, receives a reaction gas supplied from a gas supply path, and generates extreme ultraviolet light by forming plasma using the laser beam and the reaction gas with respect to a plasma induction path corresponding to a section at which focus is made; and a vacuum chamber accommodating the TLM, the FM, and the gas cell in a vacuum state. As mentioned above, according to the present invention, the wave front of the laser beam which is output from the laser source through the correction part can be corrected to resultantly provide a stable light source. In addition, it is possible to efficiently output an EUV beam even with a simple structure.</p> |
