TRAP DEVICE AND FILM FORMATION DEVICE

摘要

Provided is a trap device characterized by being provided with a housing interposed midway along an exhaust gas passage through which flow exhaust gases from a processing receptacle; and trap units disposed such that the principal trap surfaces are parallel to the direction of flow of the exhaust gases, and having a plurality of trap plates spaced apart at predetermined intervals from one another in a direction orthogonal to the direction of flow of the exhaust gases, the plurality of trap units being furnished along the direction of flow of the exhaust gases.