| 摘要 |
PROBLEM TO BE SOLVED: To provide a technique for removing gas included in a filter removing particles in a liquid medicine.SOLUTION: A filter section 4 including a filter 42 for removing particles in a liquid medicine is supplied with liquid with pressure higher than pressure when the liquid medicine is supplied in liquid processing a wafer W. Consequently, higher pressure is applied to the liquid in the filter, and so gas included in the filter is dissolved in the liquid medicine with liquid pressure of the liquid and the gas in the filter 42 is thereby removed. By supplying the liquid medicine to a coating nozzle 85 of a coating module 8 through the filter 4, the liquid processing on the wafer W can be performed using the liquid medicine which is extremely small in particle and gas content, so that occurrence of a defect can be suppressed. |
