| 摘要 |
A photosensitive resin composition and a photospacer having excellent flexibility and resilience are provided to be readily developed in alkali and to produce a curing product having excellent flexibility and resilience. A photosensitive resin composition comprises a hydrophilic polymer(A), a multifunctional (meth)acrylate monomer(B), a polysiloxane having at least two hydrolytic alkoxy groups(C) and a photopolymerization initiator(D). The polysiloxane(C) having at least two hydrolytic alkoxy groups is a product obtained by condensation using at least one of a silane compound(c1) represented by the formula(1) of R2mSi(R1)(OR3)3-m and a silane compound(c2) represented by the formula(2) of R4nSi(OR5)4-n, as an essential monomer. In the formulae, R1 is at least one organic group selected from C1-6 alkyl group, (meth)acryloyloxyalkyl group, glycidoxy alkyl group, mercaptoalkyl group and aminoalkyl group, R2 is saturated C1-12 aliphatic hydrocarbon group or C6-12 aromatic hydrocarbon group, R3 is C1-4 alkyl group, R4 is C1-12 saturated aliphatic hydrocarbon group or C6-12 aromatic hydrocarbon group, m is 0 or 1 and n is an integer of 0 to 2. |
