发明名称 |
METHOD AND DEVICE FOR PATTERNING COMPONENTS USING A MATERIAL BASED ON SILICON OXIDE |
摘要 |
<p>A method and an apparatus for forming a structure on a component made of a material composed of silicon oxide, especially of silicate glass, glass ceramic or quartz, wherein in accordance with the process at least a first surface of the component a partial removal of the material by plasma etching takes place and during the plasma etching at least at the surface to be etched a substrate temperature is established which is substantially greater than 90° C. but less than the softening temperature of the material. The apparatus is equipped for this purpose with a heater for generating the substrate temperature.</p> |
申请公布号 |
EP2094617(B1) |
申请公布日期 |
2013.09.25 |
申请号 |
EP20070817751 |
申请日期 |
2007.10.30 |
申请人 |
FHR ANLAGENBAU GMBH |
发明人 |
GESSNER, THOMAS;BERTZ, ANDREAS;SCHUBERT, REINHARD;WERNER, THOMAS;HENTSCH, WOLFGANG;FENDLER, REINHARD;KOEHLER, LUTZ |
分类号 |
C03C15/00;H01L21/00 |
主分类号 |
C03C15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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