| 摘要 |
PURPOSE: A deposition apparatus is provided to continuously measure a deposition rate without returning the pressure in a vacuum chamber to an atmospheric pressure. CONSTITUTION: A deposition apparatus attaches a deposition material to a member subjected to deposition. A control means, which controls the opening degree of a path, is installed on a path that guides the evaporated deposition material to the member subjected to deposition. A first pressure sensor (21) is installed in the path in the more downstream than the control means. A second pressure sensor (22) is installed in the vacuum tub or the path in the more downstream than the first pressure sensor. The flow rate of the evaporated deposition material is obtained by the pressure difference measured by the two pressure sensors A controller (24) measures the deposition rate of the evaporated deposition material to the member subjected to deposition, and controls the opening degree of the path by the control means. |
