发明名称 OXIDE SEMICONDUCTOR FILM, TRANSISTOR, AND SEMICONDUCTOR DEVICE
摘要 PURPOSE: An oxide semiconductor layer, a transistor, and a semiconductor device are provided to obtain stable electrical properties by using a semiconductor layer as a channel formation region. CONSTITUTION: A determination part has a c axis on the surface of an oxide semiconductor layer. The c axis is approximately vertical to the surface. The determination part includes a crystal arrangement part. A crystal arrangement part contains indium atoms and oxygen atoms. The length of the crystal arrangement part is 1.5 nm or more.
申请公布号 KR20130105390(A) 申请公布日期 2013.09.25
申请号 KR20130024341 申请日期 2013.03.07
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI SHUNPEI;TAKAHASHI MASAHIRO
分类号 H01L29/786;H01L21/336 主分类号 H01L29/786
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