发明名称 |
OXIDE SEMICONDUCTOR FILM, TRANSISTOR, AND SEMICONDUCTOR DEVICE |
摘要 |
PURPOSE: An oxide semiconductor layer, a transistor, and a semiconductor device are provided to obtain stable electrical properties by using a semiconductor layer as a channel formation region. CONSTITUTION: A determination part has a c axis on the surface of an oxide semiconductor layer. The c axis is approximately vertical to the surface. The determination part includes a crystal arrangement part. A crystal arrangement part contains indium atoms and oxygen atoms. The length of the crystal arrangement part is 1.5 nm or more. |
申请公布号 |
KR20130105390(A) |
申请公布日期 |
2013.09.25 |
申请号 |
KR20130024341 |
申请日期 |
2013.03.07 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
YAMAZAKI SHUNPEI;TAKAHASHI MASAHIRO |
分类号 |
H01L29/786;H01L21/336 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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