发明名称 ION SOURCE AND ION IMPLANTER HAVING THE SAME
摘要 An ion source includes a filament configured to emit thermoelectrons and a cathode having a first side proximate the filament and a second side opposite the first side. The cathode includes a first layer that includes a first material on the first side of the cathode and a second layer on the second side of the cathode. The first layer is between the filament and the second side. The second layer is configured to limit discharge of the first material of the first layer from the ion source when the filament emits themoelectrons to generate ions from the ion source
申请公布号 KR20130104585(A) 申请公布日期 2013.09.25
申请号 KR20120026202 申请日期 2012.03.14
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KAMEI SEIJI
分类号 H01J37/08;H01J37/317 主分类号 H01J37/08
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