EQUIPMENT FOR SUPPLYING GASES

摘要

PURPOSE: A gas supply apparatus is provided to prevent a gas supply from being interrupted in semiconductor processing equipment by preventing the inflow of a harmful gas. CONSTITUTION: A control device (120) is installed in a cavity (100) and controls the inflow of a processing gas. A sensor (140) senses the leakage of the processing gas. A ventilation hole (110) is formed on one side of a cabinet. A processing filter (200) filters the harmful gas elements of external gas which is inputted through the ventilation hole. The processing filter is arranged between a guide rail (150) and one side of the cabinet.