发明名称 METHOD FOR PRODUCING PHOTOVOLTAIC CELL
摘要 <p>The method for producing a photovoltaic cell includes applying, on a partial region of one surface side of a semiconductor substrate, a first p-type diffusion layer forming composition including a p-type impurity-containing glass powder and a dispersion medium; applying, on at least a region other than the partial region on the surface of the semiconductor substrate, a second p-type diffusion layer forming composition which includes a p-type impurity-containing glass powder and a dispersion medium and in which a concentration of the p-type impurity is lower than that of the first p-type diffusion layer forming composition, where the first p-type diffusion layer forming composition is applied; heat-treating the semiconductor substrate on which the first p-type diffusion layer forming composition and the second p-type diffusion layer forming composition are applied to form a p-type diffusion layer; and forming an electrode on the partial region.</p>
申请公布号 EP2642529(A1) 申请公布日期 2013.09.25
申请号 EP20110841741 申请日期 2011.11.15
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 MACHII, YOICHI;YOSHIDA, MASATO;NOJIRI, TAKESHI;OKANIWA, KAORU;IWAMURO, MITSUNORI;ADACHI, SHUICHIRO;ORITA, AKIHIRO;SATO, TETSUYA;KIZAWA, KEIKO
分类号 H01L31/04;H01L21/225 主分类号 H01L31/04
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