发明名称 |
HIGH CONTRAST ALIGNMENT MARKS THROUGH MULTIPLE STAGE IMPRINTING |
摘要 |
Two-stage imprinting techniques capable of protecting fine patterned features of an imprint lithography template are herein described. In particular, such techniques may be used during fabrication of recessed high-contrast alignment marks for preventing deposited metal layers from coming into contact with fine features etched into the template. |
申请公布号 |
KR20130105661(A) |
申请公布日期 |
2013.09.25 |
申请号 |
KR20137009972 |
申请日期 |
2011.09.26 |
申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
IMHOF JOSEPH MICHAEL;SELINIDIS KOSTA;LABRAKE DWAYNE L. |
分类号 |
B29C33/30;B29C33/42;B82B3/00 |
主分类号 |
B29C33/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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