发明名称 SUBTRATE TRAY FOR SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING APPARATUS HAVING THE SAME
摘要 PURPOSE: A mask holding assembly for a substrate processing apparatus and a substrate processing apparatus having the same are provided to reduce the manufacturing costs of a substrate tray by reducing the use of a magnetic force generating part. CONSTITUTION: A mask (300) is in contact with a substrate processing surface. The mask forms opening parts. A main body (210) has an opposite surface (201). The opposite surface faces the opposite surface of the substrate processing surface. Magnetic force generating parts (410) are in contact with the substrate processing surface.
申请公布号 KR20130102835(A) 申请公布日期 2013.09.23
申请号 KR20120023981 申请日期 2012.03.08
申请人 WONIK IPS CO., LTD. 发明人 KIM, GEON;PARK, CHAN SOO
分类号 H01L51/56;H01L21/683 主分类号 H01L51/56
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