| 摘要 |
PURPOSE: A substrate processing apparatus is provided to reduce a load applied to a transfer device which transfers a substrate to the upper side of a processing bath by a horizontal movement. CONSTITUTION: A substrate received in a processing bath (11) is processed. A first transfer unit transfers a first substrate group from a substrate extracting unit (3) to the upper side of the processing bath by moving along a first path (201). A second transfer unit transfers a second substrate group from the substrate extracting unit to the upper side of the processing bath by moving along a second path (202). A third transfer unit (15) receives the first substrate group and the second substrate group from the first transfer unit and the second transfer unit and transfers the first substrate group and the second substrate group to the processing bath. The first transfer unit and the second transfer unit include a pair of holding members (32, 34) respectively. |
