LASER ANNEALING APPARATUS AND LASER ANNEALING METHOD

摘要

PURPOSE: A laser annealing apparatus and a laser annealing method are provided to form a high quality silicon layer by controlling the power of a laser beam emitted from a laser generator. CONSTITUTION: A laser generator irradiates a laser beam to a processing object. The laser generator performs an annealing process. A temperature measurement unit (190) measures temperature in real time. A control unit (200) controls the power of the laser beam. A photo diode (181) detects a change in the reflectivity of the processing object. [Reference numerals] (AA) Temperature; (BB) Time; (CC) User-desiring time-temperature graph