MASK MAKING WITH ERROR RECOGNITION

摘要

PURPOSE: A manufacturing method of a mask using error recognition is provided to offer a method and a system for providing the quality assurance enabling the usage of an assist feature and/or an optical proximity correction (OPC) and the reduction processing. CONSTITUTION: A manufacturing method of a mask comprises the following steps: receiving integrated circuit (IC) design layout data with multiple main features (102); conducting an OPC on the IC design layout data for producing a first image (106); disrupting the first image after the OPC (108); inserting a backbone into the multiple main features of the IC design layout data for producing a second image; comparing the first and second images for recognizing errors; and producing a mask based on the first image if no errors were recognized (110). [Reference numerals] (102) Design layout; (108) Disrupting; (110) Mask tooling