发明名称 ION SOURCE, HEAVY-ION BEAM IRRADIATION SYSTEM, DRIVING METHOD OF ION SOURCE, AND HEAVY-ION BEAM IRRADIATION METHOD
摘要 PROBLEM TO BE SOLVED: To always monitor a non-target ion different from a target ion, out of the ions in a vacuum vessel, in an ion source using laser.SOLUTION: A laser ablation plasma generator 27 generates laser ablation plasma 4 from a target 2 containing the element in a vacuum vessel 1. An ion beam extraction unit 18 generates an ion beam 5 by extracting ions, contained in the laser ablation plasma 4, from the vacuum vessel 1. An ion detector 9 detects a non-target ion different from a target ion, produced by ionization of an element, out of the ions in the vacuum vessel 1. As a detection result, a detection signal 14 indicating the number of non-target ions, or the value of mixture ratio of the non-target ions to the target ions is output.
申请公布号 JP2013187057(A) 申请公布日期 2013.09.19
申请号 JP20120051577 申请日期 2012.03.08
申请人 TOSHIBA CORP 发明人 SUMIYA AKIKO;HASHIMOTO KIYOSHI;SATO KIYOKAZU;YOSHIYUKI KEN;KURUSU TSUTOMU
分类号 H01J27/24;A61N5/10;G21K5/04;H01J49/26;H05H1/24;H05H7/08;H05H13/04 主分类号 H01J27/24
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