| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid processing apparatus which prevents an unprocessed region where a liquid processing is not performed to a substrate from being formed.SOLUTION: A liquid processing apparatus 10 of this invention includes: a substrate holding part 21; and a lifting member 50 provided so as to move up and down relative to the substrate holding part 21. The substrate holding part 21 includes: a holding base 22; and a first engagement member 31 and a second engagement member 32 which are provided at the holding base 22 so as to freely move and move between an engagement position where the respective engagement members 31, 32 engage with a peripheral part of the substrate W and a release position where the respective engagement members 31, 32 release the substrate W. When a first contact part 55 connected with the first engagement member 31 contacts with an upper contacted part 51 of the lifting member 50, the first engagement member 31 moves to the engagement position and the second engagement member 32 moves to the release position. When a second contact part 56 connected with the second engagement member 32 contacts with a lower contacted part 52 of the lifting member 50, the first engagement member 31 moves to the release position and the second engagement member 32 moves to the engagement position. |
