IN-LINE TYPE PLASMA CVD APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an in-line type plasma CVD apparatus with a simple structure, capable of uniformly heating a number of substrates.SOLUTION: A plurality of Si substrates 12 placed on a plate 11 made of graphite carbon are introduced into a pre-heating chamber 2 of the in-line type plasma CVD apparatus, and the substrates 12 are heated by a plurality of top lamp heaters 14 arranged above the substrates 12 and a plurality of bottom lamp heaters 15. All the top lamp heaters 14 face the same direction and are arranged in parallel, and all the bottom lamp heaters 15 face the same direction and are arranged in parallel. The top lamp heaters 14 and the bottom lamp heaters 15 are orthogonal to each other.