发明名称 |
ULTRA HIGH-SPEED WET ETCHING APPARATUS |
摘要 |
There is provided with an etching method using an etching apparatus. Four arms can be positioned in a direction substantially from a center of the stage toward a peripheral portion with an angle difference of about 90°. Etchant is supplied to a first position nearest to the center of the object which is rotating, from a first etchant supply nozzle placed on a first arm. Etchant is further supplied to a second position second nearest to the center of the object, from a second etchant supply nozzle placed on a second arm. The second arm is substantially symmetrically positioned with respect to the first arm and the second arm has an angle difference of about 180° with respect to the first arm.
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申请公布号 |
US2013244442(A1) |
申请公布日期 |
2013.09.19 |
申请号 |
US201313887730 |
申请日期 |
2013.05.06 |
申请人 |
TOHOKU UNIVERSITY NATIONAL UNIVERSITY CORPORATIONOF |
发明人 |
OHMI TADAHIRO;OHASHI TOMOTSUGU;YOSHIKAWA KAZUHIRO;YOSHIDA TETSURO;UCHIMURA TEPPEI;SOEDA KAZUKI |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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