DOPING DEVICE AND DOPING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor device which provides a doping device adding oxygen and improves electric characteristics.SOLUTION: A doping device includes: a gas introduction part into which an inactive gas is introduced; an arc chamber having a filament generating thermal electrons; a first electrode extracting ions of the inactive gas that is ionized by the arc chamber; a second electrode accelerating the ions of the inactive gas that is extracted by the first electrode; an oxygen ion supply part supplying oxygen ions to a region where the ions of the inactive gas, which are accelerated by the second electrode, pass; and a sample chamber into which the ions of the inactive gas and the oxygen ions are introduced.