| 摘要 |
PROBLEM TO BE SOLVED: To prevent a dielectric window 4 from being cut with ions of plasma 8 by reducing the plasma potential, and to increase the plasma density by processing the plasma potential while suppressing occurrence of RF oscillation thereof.SOLUTION: The plasma processing apparatus generating plasma by receiving high frequency power supply includes a high frequency power supply which supplies high frequency power, a plasma potential detection unit which detects the potential of plasma and outputs a detection signal corresponding to the level of the potential, and a control unit which controls the high frequency power being supplied from the high frequency power supply in response to the detection signal output from the plasma potential detection unit. |
